This moisturizing mask consists of 95% Centella Asiatica which soothes and activates damaged and irritated skin that requires immediate relief and repair. This mask is completely fragrant and pigment-free to best assist your skin with the high content of the active ingredient Centella Asiatica which both soothes and repairs damaged and sensitive skin, leaving it calm and healthy.
Actinidia Argute (Kiwi Extract) protects the skin from harmful external factors and contains antioxidants that leave your skin radiant with a wonderful glow.
Restores and repairs troubled, damaged and irritated skin. Relieves redness and blemishes on the skin. Protects against external harmful factors. Gives radiant and glow.
Use after cleanser, toner, essence and serum. Apply evenly over the entire face as the last step in your skin care routine as a moisturizing mask.
Centella Asiatica Extract, 1,2-Hexanediol, Aqua, Butylene Glycol, Carbomer, Tromethamine, Adenosine, Disodium EDTA, Nelumbo Nucifera Flower Extract, Madecassoside, Asiaticoside, Actinidia Arguta Fruit Extract, Hibiscus Sabdariffa Flower Extract, Asiatic Acid, Madecassic Acid, Ethylhexylglycerin